In the existing coating process, the operator places the cleaned workpiece on the stage of the coating equipment that has been balanced with the external pressure, and then the sealed coating equipment starts to evacuate. When the vacuum of the coating equipment reaches a certain negative pressure, That is, the substrate is heated by the heating base in the coating equipment, and the coating is performed by sputtering or electron beam evaporation. After the entire coating process is completed, the vacuum state is released to take out the workpiece that has completed coating, and it is repeated after replacing the next workpiece. Perform the above process. In such a coating process, there is a concern that the workpiece may be contaminated again during the process of entering the coating equipment after cleaning. Second, it must spend a lot of time waiting for the vacuum to reach the predetermined negative pressure, so it cannot be batched.

Therefore, a multifunctional magnetron sputtering coating system is provided. This system is a combination of a vacuum coating system and a vacuum glove box system, which can complete thin film evaporation in a high vacuum evaporation chamber and high purity in a vacuum glove box. Store and prepare samples and test samples after evaporation in an inert gas atmosphere. The multi-purpose magnetron sputtering coating system is mainly used for preparing various metal films, semiconductor films, dielectric films, magnetron films, optical films, superconducting films, sensing films and functional films with special needs.

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