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This system realizes triple environmental control inside a glove box:

1. Ultra-pure inert atmosphere
   A closed-loop purification system maintains ultra-high purity inert gas (e.g. N₂, Ar) in the chamber, with typical H₂O and O₂ levels < 0.1 ppm, effectively isolating the environment from moisture and oxygen.

2. Cleanroom-grade particle control
   An integrated clean system – typically ISO Class 5 (Class 100) or better, using vertical laminar or mixed turbulent flow – continuously circulates and filters the internal gas via FFUs (fan filter units). This removes micro- and sub-micron particles generated during operation, preventing contamination of nanomaterials, thin films and sensitive samples.

3. High-precision temperature and humidity control
   A dedicated air-conditioning module provides stable temperature and humidity control over the entire internal volume, solving traditional issues such as glove box temperature drift with ambient conditions, local hot spots and coarse humidity regulation.

The system simultaneously prevents chemical contamination (oxidation, hydrolysis caused by H₂O/O₂) and physical contamination (particle-induced pinholes in films, device short circuits). This is critical for fabricating high-performance optoelectronic devices (e.g. solar cells, LEDs) and for ultra-clean surface studies.

Stable temperature and humidity ensure extremely consistent material properties (e.g. solubility, viscosity) and process parameters (e.g. solvent evaporation rate, thin-film formation kinetics), dramatically improving experimental reproducibility and data comparability. As such, it serves as a core infrastructure for top-tier research institutes and high-tech enterprises pursuing disruptive innovations in advanced materials.