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This system highly integrates an electron-beam evaporation coater (main vacuum chamber) with an inert-gas glove box. Samples or substrates are loaded from the glove box into the coater and, after deposition, are transferred directly back into the glove box, so that they are never exposed to ambient atmosphere during the entire process.
It is ideal for handling perovskites, organic semiconductors, reactive metals (Li, Mg, Al), sulfides and other air-sensitive materials whose electrodes would otherwise oxidize, hydrolyze or degrade as soon as they contact air. By perfectly combining high-vacuum evaporation technology with inert-atmosphere protection, the system solves the industry-wide challenge of preventing air-sensitive materials from exposure during preparation and transfer steps.
The primary function of this glovebox system is the removal of O₂ and H₂O from a customer-specified chamber or sealed enclosure. It is widely used to create ultra-pure environments that are anhydrous, oxygen-free, and dust-free, including applications such as lithium-ion batteries and materials, semiconductors, supercapacitors, specialty lamps, laser welding, brazing, medical devices, materials synthesis, OLED, MOCVD, and more.
It is also suitable for biological applications, such as anaerobic microorganism cultivation and hypoxic cell culture.
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