In the vacuum vapor deposition process, stable vapor deposition cannot be performed, and in the worst case, some nozzles are blocked, and uniform coating cannot be performed. For this reason, after a certain period of time, the vacuum is broken, the nozzle and its surroundings are cleaned, and the vacuum is operated again. Cleaning in vacuum chambers has not been considered before. Once the vacuum of the vacuum chamber is broken, it takes time to obtain the predetermined degree of vacuum.
Therefore, a glove box vapor deposition all-in-one machine is provided. This system is a combination of a vacuum coating system and a vacuum glove box system, which can complete film evaporation in a high vacuum evaporation chamber and a high purity inert gas atmosphere. The samples are stored, prepared, and tested after evaporation.
The combination of evaporation coating and vacuum glove box realizes the fully enclosed production of evaporation, packaging, testing and other processes, so that the entire thin film growth and device preparation process is highly integrated in a complete controllable environment atmosphere system, eliminating the organic large area circuit preparation process The influence of unstable factors in the atmospheric environment ensures the production of high-performance, large-area organic optoelectronic devices and circuits.
