ATTO3 – Thermal Evaporation Thin Film Deposition System

Factory Price, Hige Quality

Description

Model		ATTO – 3
Main vacuum chamber		Square front door structure, size: ø300 X 400mmmm;
Sample room (optional)		Open door structure, the size is about ø200 X 300mm
Vacuum system configuration	Main vacuum chamber	Compound molecular pump, mechanical pump, pneumatic gate valve
Vacuum system configuration	Sample room	Mechanical pump, molecular pump, valve
Ultimate pressure	Main vacuum chamber	≤6. 67×10-5pa(After baking and degassing)
Ultimate pressure	Sample room	≤6.67X10-4 pa(After baking and degassing)
Recovery vacuum time	Main vacuum chamber	6. 6×10-4 pa Pa can be achieved in 30 minutes((The system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping)
Recovery vacuum time	Sample room	6.6×10-3 Pa can be achieved in 30 minutes(The system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping)
Magnetron target assembly		2-4 sets of permanent magnet targets; target size ø60mm (one of which can be sputtered magnetic material); each target is compatible with RF sputtering and DC sputtering; water cooling inside the target; three targets can be folded towards the center of the sample above The distance from the sample is 90 ~ 110mm; each target is equipped with a pneumatic baffle.
Substrate heating stage	Sample size	ø2 inch
	Exercise method	The substrate can rotate continuously, Rotating speed 0-30rpm
	heating	Substrate heating temperature 600℃±1℃
	Bezel form	Imported SMC corner cylinder control
Process gas system		Mass flow controller 2-4
* Optional parts	Injection chamber magnetron target assembly	Permanent magnet target, target size ø 60mm。
	Thickness meter	Domestic / import
	Quiet air pump	Oil-free lubrication
	Computer control system	Automatic control, process reading, parameter setting, real-time monitoring and other functions
Equipment Area	Host	1800X1200mm2
Equipment Area

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