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The configuration of a left small transfer chamber, right large transfer chamber and a single-station glove box is an asymmetrical design that has been highly optimized for specific process flows, and can also serve as the core module of a highly integrated sealed-process system.
Instead of a simple symmetric “dual channel”, the functions are differentiated according to material properties, transfer frequency and operating sequence:
The left small antechamber is typically used for rapid, high-frequency transfer of small, clean materials or tools.
The right large antechamber is dedicated to transferring large equipment, bulk materials, finished products, or items requiring special handling.
The central glove box maintains an inert atmosphere with ultra-low H₂O and O₂ levels, where all critical operations are carried out. This layout implements a “primary–auxiliary separation and size-based segregation” of logistics, greatly improving operating efficiency and space utilization. It also allows materials with different risk levels to be transferred through different channels, thereby enhancing overall safety.

When you select Etelux Solutions as your technology provider, you'll be placing your Glovebox& Vacuum Coating Equipment infrastructure in the hands of experienced, trained professionals. We take a different approach and the results are clear. People love our team and the services we provide.
We have more than 16 years of glove box manufacturing experience and have been awarded 35 technical patents.
Our R & D team is committed to innovative technology. Through comprehensive international technical exchange & collaboration and through continuous application of cutting edge engineering and manufacturing techniques we create “state-of-the-art” products and customized solutions to serve the diverse needs of our client base.
We have deployed an ERP system that vigorously and systematically controls, tracks, and monitors the fulfilment process from placement of an order through design, manufacture delivery, installation & commissioning, and post-sale service.
Gantry Machining Centers, CNC Turning Centers, Welding Robots, CNC Press Brake, Laser Cutting Machine and Helium Mass Spectrometer leak detection are among the equipment we use every day to produce our glove boxes. These facilities and equipment not only ensure the consistency of the products, but they also enable us to shorten the prototyping cycle of new product R & D and product customization.
The key to our client service is our seamless integration of deep industry and functional expertise with tools and capabilities to support execution and make change happen—on a global scale.
By providing a shared, continuous large internal chamber with no intermediate partitions, operators on the left and right sides can work together or each take charge of one end of the equipment. Powders and tools can be passed directly and freely by hand inside the box, seamlessly linking multiple process steps so that complex powder-handling workflows run as efficiently as an assembly line. Equipped with a powerful circulation-purification system and high-efficiency dust-filtration unit, the moisture and oxygen concentrations are completely uniform throughout the working area. The system is ideally suited for one or several fully compatible materials with no risk of cross-contamination, where maximum-efficiency continuous operation is required.
The dual-sided large main chamber is designed without internal partitions, creating a shared, unobstructed working volume that can accommodate multiple large instruments and substantial quantities of materials.
The four workstations allow more operations to run in parallel, enable clear functional zoning, and significantly accelerate R&D iterations or small-batch pilot production.
The extended antechamber can accept extra-long tools or samples and transfer a large amount of material in a single cycle, reducing the number of evacuation / refill cycles required.
With a split-type architecture, the purification unit that generates noise and heat is physically separated from the operator chamber. In this way, the system combines the efficiency and stability required for industrial production with the flexibility and ultra-high purity standards demanded by research equipment. It is an ideal platform for the critical pilot-scale up stage that bridges laboratory R&D and full-scale manufacturing.
Built on the foundation of a conventional glovebox, this system integrates atmosphere control and isolation, active electrostatic elimination, and active particle (micro-contaminant) control. It prevents dust adhesion caused by static charge, eliminates electrostatic discharge (ESD) damage to miniaturized circuits, and maintains—while also restoring—ultra-high cleanliness inside the chamber. By simultaneously controlling the three major contamination sources—atmosphere + static electricity + particulates—the system can rapidly self-purify and recover a clean operating environment. It is ideal for applications with extreme requirements for cleanliness, static control, and contaminant removal.
The primary function of this glovebox system is the removal of O₂ and H₂O from a customer-specified chamber or sealed enclosure. It is widely used to create ultra-pure environments that are anhydrous, oxygen-free, and dust-free, including applications such as lithium-ion batteries and materials, semiconductors, supercapacitors, specialty lamps, laser welding, brazing, medical devices, materials synthesis, OLED, MOCVD, and more.
It is also suitable for biological applications, such as anaerobic microorganism cultivation and hypoxic cell culture.
This system features a double-sided glovebox with twelve glove ports, allowing equipment to be integrated into a single large chamber without any physical internal partitions, so large devices (e.g., robot-arm rails) and samples can move freely. Operators can access most areas inside the chamber simultaneously from both sides, enabling complex part transfer and collaborative assembly.
The heated antechamber is a key technology for maintaining long-term, stable sub-ppm ultra-high purity. All items entering the main chamber (substrates, wafers, tools, packaging, etc.) are baked in situ at elevated temperature to remove adsorbed moisture and organics from surfaces and pores, eliminating contamination at the source.
In the single-station glovebox, a single-loop circulation purification system ensures highly consistent H₂O and O₂ levels, making it suitable for preparing, coating, drying, and handling samples that are highly sensitive to humidity and oxygen.
This system enables a complex process chain that would otherwise require transfers between multiple independent ultra-clean rooms or gloveboxes. It is an end-to-end engineering solution for the top-level challenge of complex assembly and manufacturing that cannot be exposed to air, and is commonly used in cutting-edge R&D fields with extreme requirements for reliability, purity, and integration.
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