Description

Atto10 is a proven, robust and versatile design standard solution. The system can be operated manually and automatically and has a wide range of deposition instrument options including: electron beam evaporators, RF and DC sputtering sources, low temperature organic evaporators and metal evaporators. There are also many system options available, such as quartz crystal monitoring, high vacuum load lock and heating, cooling, rotating or static sample stage.

The system has high vacuum pressure and evacuation time tests. Industry software control systems with advanced programming capabilities, system flexibility, they can be configured as sputtering systems, electron beam systems, OLED systems, thermal evaporation systems or any combination of these processes. A variety of optical and spectroscopic techniques can be integrated and the system integrated into a research glove box that requires an inert atmosphere.

Features

Multi-station glove box purification protection system

Water oxygen content

Germany Baode solenoid valve modular design, excellent sealing performance

European process requirements

Wide pressure range to 10 -9 Torr

Low exhaust

Excellent film uniformity and deposition rate

Efficient sputtering target utilization

Excellent target management mechanism eliminates the need for thermal paste, management staff, etc.

Compact, modular magnet array

Magnet is not exposed to vacuum, magnet is not exposed to cooling water

During target replacement, the cooling water will not be exposed to the vacuum chamber

Unbalanced operation and compatibility with magnetic materials are available

Full range of accessories (ventilation, chimneys, shutters, cluster arrays, etc.)

Custom sputtering source configuration available

Applications

In the semiconductor industry, MOCVD technology, microelectronic semiconductors, OLED / PLED development and production, lithium ion battery development and production, nanomaterial research, catalyst research, and research and development of perovskite solar cells

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